儀器設備EQUIPMENT

鍍膜設備

 

* E-Beam Gun Evaporation System  (電子槍蒸鍍機)

Brand & Model: Home-made

Specification:

1.      One 7kW E-Beam source

2.      One assisted pulse type ion source

3.      Three thermal resistive sources

4.      Optical monitor 350-1100nm

5.      Quartz thickness monitor

6.      Four 15c.c. hearths

7.      Substrate heating: R.T~250oC

8.      Working pressure: 1x10-6torr~5x10-4torr

Functions:     

1.      Metal film – Au, Ag, Al, Cr, Si ……

2.      Dielectric film – TiO2, SiO2, Ta2O5, MgF2, Al2O3 ……

3.      Anti-reflection coating, High reflection mirror, Color filter ……

 

 

 

* Dual E-Beam Gun Evaporation System (雙電子槍蒸鍍機)

Brand & Model: Home-made (Sponsored by NSC & Fulintec)

Specification:

 1. Two 16kW E-Beam sources

 2. One assisted ion source

 3. Two thermal resistive sources

4. Optical monitor 330-950nm

5. Quartz thickness monitor

6. Twelve 20c.c. hearths

7. One 12” Quartz ring hearth

8. Substrate heating: R.T~250oC

9. Working pressure: 1x10-6torr~5x10-4torr

Functions:

1. Metal film – Au, Ag, Al, Cr, Si ……

 

 

 

* Magnetron Sputter (磁控濺鍍機)

Brand & Model: Home-made (Sponsored by ULVAC & Fulintec)

Specification:

1. Three sputter sources (Pulse DC: 0.5&1.5kW, RF 10kW)

2. Two 6” & Two 3” targets

3. One assisted ion source

4. Optical monitor 400-800nm

5. Substrate heating: R.T~400oC

6. Working pressure: 1x10-6torr~8x10-3torr

Functions:

1. Metal film – Al, Si ……

2. Dielectric film – TiO2, SiO2, Ta2O5, Al2O3 ……

3. Anti-reflection coating, High reflection mirror, Color filter …

4. Hard coating

5. Coating on glass and plastic substrates

 

 

 

 

 

* Ion Beam Sputtering Deposition System (離子束濺鍍機)

Brand & Model: Home-made

Specification:

1. Two 3cm DC ion beam source

2. Four 4” targets

3. Optical monitor at 460, 500, 650, 700nm

4. Quartz thickness monitor

5. Substrate heating: R.T~200oC

6. Working pressure: 1x10-6torr~5x10-4torr

Functions:

1. Metal film – Al, Mo, Si, W ……

2. Dielectric film – TiO2, SiO2, Ta2O5, Al2O3 ……

3. Low-loss mirror, Anti-reflection coating,High reflection mirror, Color filter

 

 

 

* RF Ion Beam Sputtering Deposition System (射頻離子束濺鍍機)

Brand & Model: Home-made

Specification:

1. Two RF ion beam sources (6cm & 3cm)

2. Two 20cmx15cm targets

3. Optical monitor 400nm-800nm; 1550nm

4. Quartz thickness monitor

5. Substrate heating: R.T~150oC

6. Working pressure: 1x10-6torr~5x10-4torr

Functions:

1. Metal film – Al, Mo, Si, ……

2. Dielectric film – TiO2, SiO2, Ta2O5, Nb2O5, Al2O3 ……

3. DWDM filter, Anti-reflection coating,

High reflection mirror, Color filter ……

 

 

 

 

 

* Spin Coater (旋轉塗佈鍍膜機)                                                            

Brand & Model: General Space Enterise Co, Ltd.

Specification:

1. Three-step spin motor (10,000 rpm maximum)

2. 2”~6” Substrate holder

3. One gas inlet

Functions:

1. Sol-gel coating, SiO2……

 

 

 

 

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