儀器設備EQUIPMENT
鍍膜設備 |
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微波電漿源蝕刻系統 Microwave plasma source etching system |
雙電子槍蒸鍍機 Dual E-Beam Gun Evaporation System | |
脈衝式磁控濺鍍系統 Magnetron Sputter | 離子束濺鍍機 Ion Beam Sputtering Deposition System | |
旋轉塗佈鍍膜機 Spin Coater) | 多腔梅瓣式濺鍍系統 Cluster | |
手套箱 Glove box | 電漿輔助原子層沉積 Plasma Enhanced Atomic Layer Deposition, PEALD | |
量測設備 |
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光學顯微鏡 Optical Microscope
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*雙電子槍蒸鍍機 (Dual E-Beam Gun Evaporation System) *雙電子槍蒸鍍機 (Dual E-Beam Gun Evaporation System)
*微波電漿源蝕刻系統 (Microwave plasma source etching system) *多腔梅瓣式濺鍍系統 (Cluster)
*MOS2爐管 (MOS2 Furnace) *HBN爐管(HBN Furnace)
*旋轉塗佈鍍膜機 (Spin Coater) *手套箱 (Glove box)
*電漿輔助原子層沉積 (Plasma Enhanced Atomic Layer Deposition) *離子束濺鍍機 (Ion Beam Sputtering Deposition System)
*脈衝式磁控濺鍍系統 (Magnetron Sputter)
量測設備
- 拉曼光譜儀 Raman Spectrometer X射線繞射儀 XRD
- 表面輪廓儀 Alpha-step 光學顯微鏡 Optical Microscope